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- W2056230523 abstract "The activation enthalpies associated with stress-induced migration of O or N in Ta and Nb were accurately determined on high-purity metals doped with only one type of interstitial atoms. Internal friction and elastic aftereffect measurements were carried out in the same apparatus. New procedures were developed in processing the internal friction and elastic aftereffect data for determining the temperature dependence of the relaxation time. The activation enthalpies obtained for Ta-O, Ta-N, Nb-O and Nb-N are 1.105, 1.67, 1.15, 1.58 eV, respectively, with statistical errors in the range of ±0.01 to 0.02 eV. Nous avons déterminé avec précision les enthalpies d'activation associées à la migration induite par contrainte d'O ou N dans du tantale et du niobium de haute pureté, dopés avec un seul type d'atomes interstitiels. Nous avons effectué dans le même appareil des mesures de frottement intérieur et de trainage élastique. Nous avons développé de nouvelles techniques pour traiter les données du frottement intérieur et de la trainage élastique, afin de déterminer la variation du temps de relaxation en fonction de la température. Les enthalpies d'activation obtenues dans les systèmes Ta-O, Ta-N, Nb-O et Nb-N sont respectivement égales à 1,105, 1,67, 1,15 et l,58eV, l'erreur de mesure étant de l'ordre de ±0.01 à 0.02 eV. Die Aktivierungsenthalpien der spannungsinduzierten Wanderung von O oder N in Ta und Nb wurden an hochreinen Metallen genau bestimmt. Die Metalle waren nur mit einem der Dotieratome als Zwischengitteratome beladen. Mit demselben Experimentieraufbau wurden innere Reibung und elastischer Nachwirkungseffekt gemessen. Bei der Auswertung der entsprechenden Meβwerte wurden neue Methoden zur Bestimmung der Temperaturabhängigkeit der Relaxationszeit entwickelt. Die erhaltenen Aktivierungsenergien waren (in eV): 1,105 (Ta-O), 1,67 (Ta-N), 1,15 (Nb-O) und 1,58 (Nb-N). Der statistische Fehler liegt im Bereich 0,01 bis 0,02 eV." @default.
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- W2056230523 date "1981-06-01" @default.
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- W2056230523 title "Accurate determination of activation enthalpies associated with the stress-induced migration of Oxygen or Nitrogen in Tantalum and Niobium" @default.
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- W2056230523 doi "https://doi.org/10.1016/0001-6160(81)90056-0" @default.
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