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• W2056283988 startingPage "39" @default.
• W2056283988 abstract "Crystallographic properties of transition metal oxides (MOy and (Ti,M)Oy, with 1.9 〈 y 〈 2.5 and M = Ti, Nb and V) as thin films (e ≈ 50 nm) deposited by r.f. sputtering, were studied by conventional transmission electron microscopy. Samples were annealed by the electron beam (up to 2000 K). Generally, the thin layers were initially amorphous. TiOy samples crystallized according to the TiO2 anatase and rutile phases. After heating (about 1000 K), NbOy and (Ti, Nb)Oy films crystallized according to the NbO2 and (Ti, Nb)O2 structures. At higher temperatures, different Nb2O5 compounds and unknown phases were formed. VOy layers generally exhibit the formation of the V6O13 compound, whereas (Ti, V)Oy samples yielded unexpected and unknown compounds (such as VnO2n−1 + TiO2, TimVn−mO2n−1,…)." @default.
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• W2056283988 date "1990-05-01" @default.
• W2056283988 modified "2023-09-25" @default.
• W2056283988 title "Pure and mixed titanium, niobium and vanadium as sputtered thick and thin films: Crystallographic properties and phase transitions between 300 and 1800 K II: Electron microscopy investigations of thin films" @default.
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• W2056283988 doi "https://doi.org/10.1016/0040-6090(90)90108-p" @default.
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