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- W2056510541 abstract "While investigating the surface dependence of the dry cleaning technique using Cl radicals generated with UV irradiation (UV/Cl 2 , we found that silicon chlorides [SiCl x (x = 1 to 4)], etching products created from a reaction between Si and Cl radicals, can remove Fe contaminants. SiCl 4 gas removes Fe contaminants existing on both Si and SiO 2 surfaces without surface dependence. The surface residue due to the adsorption of SiCl 4 is insignificant. We also found that a small addition of Cl 2 to SiCl 4 is advantageous for dry cleaning Si surfaces. Surface flatness and composition are maintained after cleaning with Cl 2 + SiCl 4 (5:195 ml/min) gas mixture. Dry cleaning technology has been significantly improved by the use of an SiCl 4 -based system instead of Cl 2 alone." @default.
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- W2056510541 date "1997-11-01" @default.
- W2056510541 modified "2023-09-27" @default.
- W2056510541 title "Dry Cleaning for Fe Contaminants on Si and SiO2 Surfaces with Silicon Chlorides" @default.
- W2056510541 doi "https://doi.org/10.1149/1.1838123" @default.
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