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• W2056518489 abstract "Recent advanced FIB systems enable one to define patterns with a dimension around 10 nm, which is required for quantum devices operating near room temperature and is of increasing importance for nanofabrication tools. Various nanofabrication techniques using focused ion beams have been investigated including lithography, maskless ion implantation and in situ fabrication. For direct nanofabrication by FIB, generation of damage may be a problem for some applications, but previous investigations suggest that this can be minimized by using proper processing techniques." @default.
• W2056518489 created "2016-06-24" @default.
• W2056518489 creator A5081276816 @default.
• W2056518489 date "1996-09-01" @default.
• W2056518489 modified "2023-10-11" @default.
• W2056518489 title "Nanofabrication by FIB" @default.
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• W2056518489 doi "https://doi.org/10.1016/0167-9317(96)00003-2" @default.
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