Matches in SemOpenAlex for { <https://semopenalex.org/work/W2056534057> ?p ?o ?g. }
Showing items 1 to 72 of
72
with 100 items per page.
- W2056534057 abstract "The practical extendibility of immersion lithography to the 32nm and 22nm nodes is being supported on immersion microsteppers installed at SEMATECH in Albany, New York. As the industry pushes the limits of water-based immersion technologies, research has continued into developing alternative materials to extend optical lithography for upcoming device generations. High index materials have been the primary focus of investigation, including optical lens materials such as lutetium aluminum garnet (LuAG with n=2.14) and barium lithium fluoride (BaLiF3 with n=1.64), high index fluids (Gen 2 and Gen 3 with n>=1.64), and resists. On a parallel and potentially complementary path, double patterning and double exposure technologies have been proposed. For high index materials research, the Amphibian XIS has demonstrated imaging at 1.50NA (32nm half-pitch) with high index fluids. A prism module is also available to enable imaging with potential BaLiF<sub>3</sub> and LuAG prisms. The Exitech MS193i has demonstrated performance and imaging capability at 38nm hp with k<sub>1</sub>=0.256 at 1.30NA. Modifications at the mask plane now provide a double exposure capability, offering an imaging platform to investigate experimental classes of nonlinear materials and enabling double exposure imaging below k<sub>1eff</sub>=0.25. In this paper, we will discuss recent developments in these research areas supported by the toolset at SEMATECH." @default.
- W2056534057 created "2016-06-24" @default.
- W2056534057 creator A5004412911 @default.
- W2056534057 creator A5021428482 @default.
- W2056534057 creator A5028414463 @default.
- W2056534057 creator A5037968492 @default.
- W2056534057 creator A5057536134 @default.
- W2056534057 creator A5071371676 @default.
- W2056534057 date "2008-03-14" @default.
- W2056534057 modified "2023-09-23" @default.
- W2056534057 title "Continuing 193nm optical lithography for 32nm imaging and beyond" @default.
- W2056534057 doi "https://doi.org/10.1117/12.775474" @default.
- W2056534057 hasPublicationYear "2008" @default.
- W2056534057 type Work @default.
- W2056534057 sameAs 2056534057 @default.
- W2056534057 citedByCount "2" @default.
- W2056534057 crossrefType "proceedings-article" @default.
- W2056534057 hasAuthorship W2056534057A5004412911 @default.
- W2056534057 hasAuthorship W2056534057A5021428482 @default.
- W2056534057 hasAuthorship W2056534057A5028414463 @default.
- W2056534057 hasAuthorship W2056534057A5037968492 @default.
- W2056534057 hasAuthorship W2056534057A5057536134 @default.
- W2056534057 hasAuthorship W2056534057A5071371676 @default.
- W2056534057 hasConcept C120665830 @default.
- W2056534057 hasConcept C121332964 @default.
- W2056534057 hasConcept C171250308 @default.
- W2056534057 hasConcept C177409738 @default.
- W2056534057 hasConcept C191897082 @default.
- W2056534057 hasConcept C192562407 @default.
- W2056534057 hasConcept C204223013 @default.
- W2056534057 hasConcept C2777207636 @default.
- W2056534057 hasConcept C2779227376 @default.
- W2056534057 hasConcept C2779851234 @default.
- W2056534057 hasConcept C41008148 @default.
- W2056534057 hasConcept C49040817 @default.
- W2056534057 hasConcept C520551903 @default.
- W2056534057 hasConcept C531131001 @default.
- W2056534057 hasConcept C53524968 @default.
- W2056534057 hasConcept C94263209 @default.
- W2056534057 hasConceptScore W2056534057C120665830 @default.
- W2056534057 hasConceptScore W2056534057C121332964 @default.
- W2056534057 hasConceptScore W2056534057C171250308 @default.
- W2056534057 hasConceptScore W2056534057C177409738 @default.
- W2056534057 hasConceptScore W2056534057C191897082 @default.
- W2056534057 hasConceptScore W2056534057C192562407 @default.
- W2056534057 hasConceptScore W2056534057C204223013 @default.
- W2056534057 hasConceptScore W2056534057C2777207636 @default.
- W2056534057 hasConceptScore W2056534057C2779227376 @default.
- W2056534057 hasConceptScore W2056534057C2779851234 @default.
- W2056534057 hasConceptScore W2056534057C41008148 @default.
- W2056534057 hasConceptScore W2056534057C49040817 @default.
- W2056534057 hasConceptScore W2056534057C520551903 @default.
- W2056534057 hasConceptScore W2056534057C531131001 @default.
- W2056534057 hasConceptScore W2056534057C53524968 @default.
- W2056534057 hasConceptScore W2056534057C94263209 @default.
- W2056534057 hasLocation W20565340571 @default.
- W2056534057 hasOpenAccess W2056534057 @default.
- W2056534057 hasPrimaryLocation W20565340571 @default.
- W2056534057 hasRelatedWork W2000454316 @default.
- W2056534057 hasRelatedWork W2021301922 @default.
- W2056534057 hasRelatedWork W2054704405 @default.
- W2056534057 hasRelatedWork W2055477348 @default.
- W2056534057 hasRelatedWork W2056534057 @default.
- W2056534057 hasRelatedWork W2060678621 @default.
- W2056534057 hasRelatedWork W2072373671 @default.
- W2056534057 hasRelatedWork W2079587595 @default.
- W2056534057 hasRelatedWork W2124919317 @default.
- W2056534057 hasRelatedWork W2546756142 @default.
- W2056534057 isParatext "false" @default.
- W2056534057 isRetracted "false" @default.
- W2056534057 magId "2056534057" @default.
- W2056534057 workType "article" @default.