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- W2056544436 abstract "MgxNi thin films have been prepared by an RF-DC coupled magnetron sputtering technique. RF power and DC bias were simultaneously applied to the target in order to control the incident ion energy on the target. When a low RF power and DC bias are applied simultaneously to the target, the glow discharge takes place at a low DC bias and the target DC current increases smoothly as compared with the DC mode magnetron case. The values of the film compositional ratio Ni/Mg were obtained in the range of 1.19–0.56 at target DC bias voltages of — 50- − 200 V without changing the target area ratio of Ni to Mg. The crystalline structure of MgxNi films is influenced by the target DC bias." @default.
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- W2056544436 date "1999-04-01" @default.
- W2056544436 modified "2023-10-17" @default.
- W2056544436 title "Preparation of MgxNi thin films by RF-DC coupled magnetron sputtering" @default.
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- W2056544436 doi "https://doi.org/10.1016/s0040-6090(98)01562-4" @default.
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