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- W2056566612 abstract "Additive patterning processes of magnetic films grown using an ion-beam sputter (IBS) system designed to produce non-conformal films are described. The effects of the ion-gun beam current and Ar pressure on the sputtering rates and roughness of Ni80Fe20 and Co70Fe30 magnetic thin films are investigated using atomic-force microscopy (AFM) and the films' magnetic properties are measured using spatially resolved magneto-optical magnetometry. By tailoring the plasma solid angle, non-conformal film growth allows for simple additive patterning down to lateral dimensions ranging from a few microns to the deep-submicron regime, using templates defined by photolithography or electron-beam lithography, and shadow masks created using templated self-assembly. The magnetization reversal exhibited by patterned sub-200?nm nanodisc arrays with different lateral edge-roughness will be discussed." @default.
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- W2056566612 date "2006-03-24" @default.
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- W2056566612 title "Additive patterning of ion-beam-sputtered non-conformal Ni<sub>80</sub>Fe<sub>20</sub>and Co<sub>70</sub>Fe<sub>30</sub>magnetic films" @default.
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- W2056566612 doi "https://doi.org/10.1088/0957-4484/17/8/042" @default.
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