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- W2056573809 abstract "First demonstration is given here about the use of a VUV coherent source at 125 nm for efficient and clean etching of polytetrafluoroethylene PTFE and poly(methyl methacrylate) PMMA polymers. Measurements of etch rate as a function of fluence and number of shots are presented and compared with previous works using 157 nm (F<SUB>2</SUB> laser) and 193 nm (ArF laser). Experimental results are presented and physical approach is made with classical Beer-Lambert's absorption law and discussed." @default.
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- W2056573809 date "1998-05-26" @default.
- W2056573809 modified "2023-09-26" @default.
- W2056573809 title "<title>Ablation dynamic studies of polymers with a coherent VUV source at 125 nm</title>" @default.
- W2056573809 doi "https://doi.org/10.1117/12.308622" @default.
- W2056573809 hasPublicationYear "1998" @default.
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