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• W2056598593 abstract "We have investigated the effect of base pressure of the sputtering chamber on the structure and magnetic properties of the FePt thin films. The A1-FePt thin films deposited at room temperature, at a low base pressure of 5.5×10 −7 Torr was ordered to the L1 0 structure at a low annealing temperature of 200 °C and a highly ordered L1 0 phase was formed by annealing the film at 300 °C. On the other hand, for the A1-FePt thin films deposited at a higher base pressure of 5.5×10 −5 Torr, the ordering to the L1 0 structure took place at a higher annealing temperature of 400 °C and a fully ordered L1 0 phase was obtained when the film was annealed at 600 °C. These observations suggest that the low base pressure of the sputtering chamber is effective to reduce the kinetic ordering temperature to a much lower annealing temperature of 200 °C." @default.
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• W2056598593 date "2008-02-01" @default.
• W2056598593 modified "2023-09-26" @default.
• W2056598593 title "Effect of base pressure on the structure and magnetic properties of FePt thin films" @default.
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• W2056598593 doi "https://doi.org/10.1016/j.jmmm.2007.05.027" @default.
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