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- W2056791443 abstract "The solid state reaction between copper and germanium has been studied in diffusion couples in the range 400 to 575°C. The main product is coarse-grained Cu3Ge, but Cu5Ge and the (Cu, Ge) solid solution are also formed, albeit in thin layers. The reaction rate is determined by bulk diffusion of copper through the germanide layer, with an activation energy of 104 kJmol. Above 570°C a sudden acceleration occurs. At 500°C the interdiffusion coefficient in the solid solution is 6 × 10−12cm2s, ~̊D(Cu5Ge) = 4 × 10−11cm2s and ~̊D in Cu3Ge is raised from 1 × 10−10cm2s at 22 atom-% Ge to 1×10−8 cm2/s at 25 atom-% Ge. Contrary to the copper-silicon reaction, no reaction barrier has been observed, and so the presence of phosphorus in copper does not influence the reaction between copper and germanium." @default.
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- W2056791443 date "1988-10-01" @default.
- W2056791443 modified "2023-09-24" @default.
- W2056791443 title "The solid state diffusion reaction of copper with germanium; a comparison between silicon and germanium" @default.
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- W2056791443 doi "https://doi.org/10.1016/0168-7336(88)80046-9" @default.
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