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- W2056795003 abstract "While directed self-assembly of diblock copolymers is increasingly developed in terms of process flow, metrology and evaluation are the next crucial step in maximizing its effectiveness for integration into device design based on directed self-assembly trends. We present a novel image processing and data analysis program, SLICE (Sub-Lithography Imaging Computation and Evaluator), whose capabilities enable a systematic, automated analysis and characterization of directed self-assembly (SA) of block copolymers for high-density circuit integration. Key features such as defect-free region detection and trench-to-trench comparison of SA quality illustrate the potentially significant impact of SLICE to the process optimization and commercialization of sub-lithographic techniques." @default.
- W2056795003 created "2016-06-24" @default.
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- W2056795003 date "2010-03-11" @default.
- W2056795003 modified "2023-10-17" @default.
- W2056795003 title "SLICE image analysis for diblock copolymer characterization and process optimization" @default.
- W2056795003 doi "https://doi.org/10.1117/12.848378" @default.
- W2056795003 hasPublicationYear "2010" @default.
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