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- W2056802635 abstract "Abstract The important role of chemical vapor deposition (CVD) in modern technology is reviewed in terms of its ability to form high purity (or controlled-composition) deposits, often of unique structure, with high throwing power. An overview of the factors influencing deposition rate and structure is given, with emphasis on the trade-offs that must be considered in achieving useful results most economically. Progress in the modelling of CVD reactors is cited. Characterization of CVD reactions by the rate-controlling factors has been enhanced in recent years by the van den Brekel technique of measuring and of interpreting the deposition profile on the wall of a narrow hole in the substrate, thus optimizing the deposition conditions for a given application. The increasing importance of two-phase CVD products is noted, with warnings of the limitations imposed by kinetic dissimilarity in the competing reactions. Further increase in the importance of CVD is foreseen through attention being paid to the fundamental aspects of this inherently complex technology." @default.
- W2056802635 created "2016-06-24" @default.
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- W2056802635 date "1988-12-01" @default.
- W2056802635 modified "2023-09-30" @default.
- W2056802635 title "Chemical vapor deposition for surface conditioning: Opportunities and cautions" @default.
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- W2056802635 doi "https://doi.org/10.1016/0025-5416(88)90728-8" @default.
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