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- W2056893964 abstract "The paper presents the different techniques in fabricating wafer process and the used of EUV lithography and it would still do a side bet on optical lithography. And to maximise the use of grating-like feature, chipmakers such as Intel and Samsung are using a technique called double patterning. Here. the exposure is performed in two stages using two different masks." @default.
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- W2056893964 date "2010-11-13" @default.
- W2056893964 modified "2023-09-27" @default.
- W2056893964 title "Step out of the light [lithography]" @default.
- W2056893964 doi "https://doi.org/10.1049/et.2010.1720" @default.
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