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- W2057200079 abstract "Abstract Si1CxNy layers were prepared by sequential implantation of 40 keV 13C- and 50 keV 15N-ions into c-Si 〈1 1 1〉 samples near RT. The carbon and nitrogen depth distributions were measured using the resonant nuclear (p,γ) reactions 15N(p,αγ)12C at Eres=429 keV and 13C(p,γ)14N at Eres=1748 keV, respectively. The measured raw data of depth profiling (gamma yield versus the proton beam energy) are converted to concentration-depth profiles of the elements C, N and Si with a common depth scale by using a new developed computer algorithm. These concentration profiles are compared with those obtained with Auger Electron Spectroscopy (AES) and non-Rutherford Backscattering Spectrometry (n-RBS)." @default.
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- W2057200079 date "1998-04-01" @default.
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- W2057200079 title "C and N depth profiles of SiCN layers determined with nuclear reaction analyses and AES" @default.
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- W2057200079 doi "https://doi.org/10.1016/s0168-583x(97)00976-2" @default.
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