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• W2057568979 startingPage "022107" @default.
• W2057568979 abstract "It is shown that the nanocryatalline silicon ballistic electron emitter operates in a SiCl4 solution without using any counter electrodes and that thin amorphous Si films are efficiently deposited on the emitting surface with no contaminations and by-products. Despite the large electrochemical window of the SiCl4 solution, electrons injected with sufficiently high energies preferentially reduce Si4+ ions at the interface. Using an emitter with patterned line emission windows, a Si-wires array can be formed in parallel. This low-temperature liquid-phase deposition technique provides an alternative clean process for power-effective fabrication of advanced thin Si film structures and devices." @default.
• W2057568979 created "2016-06-24" @default.
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• W2057568979 date "2013-01-14" @default.
• W2057568979 modified "2023-09-27" @default.
• W2057568979 title "Liquid-phase deposition of thin Si films by ballistic electro-reduction" @default.
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• W2057568979 doi "https://doi.org/10.1063/1.4788678" @default.
• W2057568979 hasPublicationYear "2013" @default.
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