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• W2057584140 abstract "Pt emitters were deposited using electron-beam-induced reaction on overetched Si emitters fabricated by a conventional dry etching process. An emission current of 10 µA was obtained from a 100-tip field emitter array (FEA) at an extraction voltage of 100 V. A prototype of a nanometer-sized field emitter was fabricated using focused ion beam (FIB) etching and electron-beam-induced deposition (EBID)." @default.
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• W2057584140 date "1996-12-01" @default.
• W2057584140 modified "2023-10-14" @default.
• W2057584140 title "Electron-Beam-Induced Deposition of Pt for Field Emitter Arrays" @default.
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• W2057584140 doi "https://doi.org/10.1143/jjap.35.6623" @default.
• W2057584140 hasPublicationYear "1996" @default.
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