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- W2057704280 abstract "In this paper, Al-doped ZnO thin films were deposited on glass substrates by RF magnetron sputtering and subsequently rapid thermal processing was executed under temperature range from 300°C to 600°C in order to investigate the microstructure, electrical, and optical properties of AZO films. XRD and AFM microscopy results showed that all the samples were of poly-crystalline and the grain size became larger with the increasing processing temperature. Compared with the sample as-deposited, it was shown that resistivity decreased from 1.9×10 -2 to 1.48×10 -3 Ωcm and carrier concentration increased from 1.48×10 20 to 5.59×10 20 cm 3 when the sample was processed at 600°C in pure nitrogen for 1 min. The highest transmittance of the samples processed at 500°C improves to 90.35% compared with the as-deposited films (68.2% ) as the wavelength varied between 400 and 900 nm." @default.
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- W2057704280 date "2013-12-01" @default.
- W2057704280 modified "2023-09-28" @default.
- W2057704280 title "Effects of Rapid Thermal Process on the Microstructural, Electrical and Optical Properties of AZO Thin Films" @default.
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- W2057704280 doi "https://doi.org/10.4028/www.scientific.net/amm.441.11" @default.
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