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Matches in SemOpenAlex for { <https://semopenalex.org/work/W2058149046> ?p ?o ?g. }

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• W2058149046 abstract "Changes in surface roughness have been studied as a function of bulk compressive and tensile strains (biaxial in the plane of the sample surface) in thin films of compositionally uniform and dislocation-free ${mathrm{Ge}}_{0.5}$${mathrm{Si}}_{0.5}$. A pronounced surface roughness is observed only for films under compressive strains exceeding 1.4%. Molecular dynamics simulations show that this striking result has its origin in the strain-induced lowering of surface step free energies." @default.
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• W2058149046 date "1994-11-28" @default.
• W2058149046 modified "2023-09-30" @default.
• W2058149046 title "Semiconductor Surface Roughness: Dependence on Sign and Magnitude of Bulk Strain" @default.
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• W2058149046 doi "https://doi.org/10.1103/physrevlett.73.3006" @default.
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