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- W2058308517 abstract "We measure light-induced D tracer diffusion in hydrogenated amorphous silicon samples under conditions at which thermal diffusion is negligible. Under high-intensity (9 W ${mathrm{cm}}^{mathrm{ensuremath{-}}2}$), red-light soaking at 135 ifmmode^circelsetextdegreefi{}C, the D diffusion coefficient is ${D}_{mathrm{D}}=1.3ifmmodetimeselsetexttimesfi{}{10}^{ensuremath{-}18}{mathrm{cm}}^{2}{mathrm{}mathrm{s}}^{mathrm{ensuremath{-}}1}$ and the rate of D emission from Si-D to transport is $3.5ifmmodetimeselsetexttimesfi{}{10}^{ensuremath{-}5}{mathrm{s}}^{mathrm{ensuremath{-}}1}.$ We also find an upper bound of ${D}_{mathrm{D}}=3ifmmodetimeselsetexttimesfi{}{10}^{ensuremath{-}20}{mathrm{cm}}^{2}{mathrm{}mathrm{s}}^{mathrm{ensuremath{-}}1},$ the light-induced diffusion coefficient at 65 ifmmode^circelsetextdegreefi{}C. Previous experiments had revealed only ``light-enhanced'' diffusion between from 200 to 300 ifmmode^circelsetextdegreefi{}C, a regime in which thermal diffusion is also significant. Our 135 ifmmode^circelsetextdegreefi{}C result extends the range of the 0.9-eV activation energy for this diffusion; our 65 ifmmode^circelsetextdegreefi{}C upper bound is consistent with the extrapolation of the higher temperature data. We also measure metastable defect creation at 65 and 135 ifmmode^circelsetextdegreefi{}C to test models of light-induced metastability that involve emission of H from Si-H bonds to an H transport level. This class of models can be limited, but not excluded, by our data. The H emission parameter of the H collision model of metastability is also estimated." @default.
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- W2058308517 date "1999-02-15" @default.
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- W2058308517 title "Light-induced D diffusion measurements in hydrogenated amorphous silicon: Testing H metastability models" @default.
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- W2058308517 doi "https://doi.org/10.1103/physrevb.59.5513" @default.
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