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- W2058705232 abstract "The wavefront aberration of lithography projection lens is very important performance parameter. High-accuracyinterferometer is a cornerstone requirement for the success of projection lithography lens. Recent development of theinternational high-accuracy wavefront aberration metrology technology of projection lens is described. Severalhigh-accuracy measurement methods based on phase measurement interferometry (PMI) principle of lens wavefrontaberrations are analyzed and compared and the merits and demerits of these measurement methods are also discussed.The dominating test technology types of mainstream companies and research organizations as well as their performanceparameters are reviewed. Moreover, the performance and key technologies of point diffraction interferometer (PDI) andlateral shearing interferometer (LSI) are emphatically analyzed. Finally, the trend of high-precision system wavefrontaberration test technique is described." @default.
- W2058705232 created "2016-06-24" @default.
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- W2058705232 date "2012-10-15" @default.
- W2058705232 modified "2023-09-22" @default.
- W2058705232 title "Research progress of wavefront aberration metrology equipment of lithography projection lens" @default.
- W2058705232 doi "https://doi.org/10.1117/12.975809" @default.
- W2058705232 hasPublicationYear "2012" @default.
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