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- W2059050207 abstract "Dense silicon oxycarbide glasses (SiOC) have been produced by spark plasma sintering (SPS) of SiOC powders. Raw powders were obtained by pyrolysis under nitrogen at 1100 °C of tetraethylorthosilcate/polydimethylsiloxane (TEOS/PDMS) hybrids. SPS experiments were carried out at 1300 and 1500 °C at 10 and 80 MPa and then were studied by chemical analysis, 29Si and 13C MAS NMR, ATR, Raman, XRD, FE-SEM, density, porosity, microhardness (Hv) and thermal conductivity (K). The SiOC materials are formed by SixOC4−x units within a silica matrix where silicon carbide and graphite nanodomains are also present. After the SPS treatment the silicon carbide crystallite size is close to 2.5 nm. At 1300 °C and 1500 °C the carbon nanodomain size is close to 3 nm and 2 nm, respectively. Hv values vary from 3.4 to 9.15 GPa, for 30% and 1% of porosity, respectively. Finally, K is always close to 1.38 W m−1 K−1." @default.
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- W2059050207 date "2012-09-01" @default.
- W2059050207 modified "2023-09-30" @default.
- W2059050207 title "Dense bulk silicon oxycarbide glasses obtained by spark plasma sintering" @default.
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- W2059050207 doi "https://doi.org/10.1016/j.jeurceramsoc.2012.03.033" @default.
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