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- W2059078506 abstract "Dislocation structures in the near surface layers of α-Fe produced by repetitively pulsed intense Hf ion beams with doses of 0.23 × 1016 to 24.0 × 1016 ions cm−2 were studied by electron microscopy. Both ion implantation and plasma deposition were used. Under such conditions the maximum impurity concentration of Hf in α-Fe appeared to be 70 at.%, the dose of implanted ions being determined from profile analysis of Hf distribution by the RBS method. A developed dislocation structure is formed by ion implantation in the near surface layer of α-Fe over a depth of 100 μm. The dislocation density reaches its maximum value at a depth of 5–7 μm from the surface and is increased by about 1–2 orders of magnitude from that in the initial state. Static tensions formed in the doped layer play a decisive role in the formation of the dislocation structure." @default.
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- W2059078506 date "1991-10-01" @default.
- W2059078506 modified "2023-10-01" @default.
- W2059078506 title "Role of tension in microstructure formation in pure metals affected by ion implantation" @default.
- W2059078506 doi "https://doi.org/10.1016/0168-583x(91)95320-d" @default.
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