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- W2059351566 abstract "Abstract Thin vacuum-evaporated SiO x films with embedded Si nanoparticles are studied by applying spectral ellipsometry and transmission electron microscopy. The Si nano-inclusions in the oxide matrix were formed by thermal annealing in argon at 700 and 1000 °C for 5 and 30 min, respectively. The results have shown that during annealing the films undergo densification, and Si nano-clusters with averaged size of 3 nm are formed in amorphous phase at 700 °C and in crystalline phase at 1000 °C." @default.
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- W2059351566 date "2005-12-01" @default.
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- W2059351566 title "Silicon nanoparticles in thermally annealed thin silicon monoxide films" @default.
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- W2059351566 doi "https://doi.org/10.1016/j.mseb.2005.08.124" @default.
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