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- W2059367048 abstract "A low-temperature atomic layer deposition technique for high-κ dielectric films on GaN templates was investigated for MOS applications. This improved growth method produced capacitance densities and a field effect mobility approaching 375 cm <sup xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sup> /Vs for ZrO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> and 250 cm <sup xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sup> /Vs for HfO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> films on GaN. Furthermore, the low density of dielectric-semiconductor interface traps confirmed a reliable cohesion between the high-κ and GaN. The improved gate dielectric deposition technique has the capabilities to improve the overall quality of GaN-based MOSFETs." @default.
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- W2059367048 date "2013-12-01" @default.
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- W2059367048 title "Electrical Comparison of ${rm HfO}_{2}$ and ${rm ZrO}_{2}$ Gate Dielectrics on GaN" @default.
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