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- W2059654507 abstract "Iron-disilicide precipitates were formed by two different processes; (i) Fe+ ion implantation in Si and subsequent dry oxidation and (ii) Fe+ ion implantation at the interface of SiO2/Si and subsequent annealing. These samples were characterized by Rutherford backscattering spectrometry (RBS), transmission electron microscope (TEM), X-ray diffraction (XRD), photothermal deflection spectroscopy (PDS) and photoluminescence (PL). The implanted Fe concentrated at the SiO2/Si interface and formed β-FeSi2 precipitates by both processes. However, part of the implanted Fe still remained in SiO2 and possibly formed Fe precipitates through the process (ii). It is notable that a clear interface has formed through the process (i) whereas a defect rich region was produced in Si near the Si/SiO2 interface by the process (ii). Weak optical absorption above 0.8 eV corresponding to the band gap of β-FeSi2 was confirmed for both processes. It is noted that sharp PL was observed at 0.81 eV at 5 K for the sample (i) whereas broad PL was observed for the sample (ii). The origin of the PL was discussed from the point of view of direct transition of strained β-FeSi2, a shallow acceptor level in a non-intentionally doped p-type β-FeSi2 and defect levels, in particular dislocations in Si." @default.
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- W2059654507 date "2001-01-01" @default.
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- W2059654507 title "Formation of β-FeSi2 precipitates at the SiO2/Si interface by Fe+ ion implantation and their structural and optical properties" @default.
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- W2059654507 doi "https://doi.org/10.1016/s0040-6090(00)01744-2" @default.
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