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• W2059794503 abstract "The kinetics of O and F atoms in O2-based plasmas has been studied by time-resolved optical emission spectroscopy (actinometry) in modulated plasmas. The sticking coefficient αO of O atoms on the stainless-steel reactor walls was 0.09±0.01 in O2 plasmas containing fluorine (added as either SF6 or F2), but was about 0.5 in a pure O2 plasma. This explains the significant increase in steady-state O density as a few percent of fluorinated gas is added. The corresponding value for F atoms, αF, was 0.06±0.01, almost independent of conditions. The method also indicates the relative importance of the different electron-impact-induced mechanisms (direct excitation of ground-state atoms and dissociative excitation of feedstock molecules) for the production of emitting atoms [O 3p3P (844 nm) and F 3s2P (703 nm)] in plasmas. These results show that the widely used (steady-state) actinometry technique using 844-nm emission from O 3p3P atoms is an unreliable measure of ground-state [O] variations." @default.
• W2059794503 created "2016-06-24" @default.
• W2059794503 creator A5084262464 @default.
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• W2059794503 date "1991-07-15" @default.
• W2059794503 modified "2023-10-18" @default.
• W2059794503 title "Oxygen and fluorine atom kinetics in electron cyclotron resonance plasmas by time‐resolved actinometry" @default.
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• W2059794503 doi "https://doi.org/10.1063/1.349662" @default.
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