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- W2059869245 abstract "Novel 200V power devices, including the n-type lateral insulator gate bipolar transistor (nLIGBT), the n-type lateral extended drain MOS (nLEDMOS) and the p-type lateral extended drain MOS (pLEDMOS), have been fabricated by using the special 0.5μm inverted HV-well SOI technology. All the novel devices own larger current density, higher off-state breakdown voltage (BV) and better hot-carrier reliability comparing with the conventional devices. The improved devices have been successfully used for the plasma display panel (PDP) scan driver IC and reduce the chip size by 27%." @default.
- W2059869245 created "2016-06-24" @default.
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- W2059869245 date "2013-05-01" @default.
- W2059869245 modified "2023-09-26" @default.
- W2059869245 title "Novel 200V power devices with large current capability and high reliability by inverted HV-well SOI technology" @default.
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- W2059869245 doi "https://doi.org/10.1109/ispsd.2013.6694442" @default.
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