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• W2059959123 abstract "We investigate the effects of an ultrathin yttrium interlayer at the interface of lanthanum aluminate and silicon with thermal annealing. Addition of the yttrium interlayer resulted in a smaller increase in the valence band offset, a reduction in the interface trap density, and a close to four-order reduction in leakage current after thermal annealing. The valence band offsets are measured with X-ray photoelectron spectroscopy and compared with those obtained from electrical measurements. The good correlation of the two measurements indicates a change in the valence band offset caused by interface dipoles. The performance improvements are attributed to a reduction in lanthanum interdiffusion and the formation of an yttrium-rich silicate interfacial layer, which minimize leakage current flow and reduce hydrogen desorption in interface trap formation." @default.
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• W2059959123 date "2010-01-01" @default.
• W2059959123 modified "2023-10-03" @default.
• W2059959123 title "Thermal Stability Improvement of the Lanthanum Aluminate/Silicon Interface Using a Thin Yttrium Interlayer" @default.
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• W2059959123 doi "https://doi.org/10.1149/1.3494150" @default.
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