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- W2060057713 abstract "Double-barrier resonant-tunneling diodes were fabricated from Fe3Si (10 nm)/CaF2 (5 nm)/Fe3Si (4 nm)/CaF2 (5 nm) on n+-Si(111) substrates by molecular beam epitaxy. Negative differential resistance was observed in the current–voltage (J–V) characteristics at room temperature (RT). The peak-to-valley current ratio was found to reach a value as large as approximately 1000 at RT. Peaks were observed in the d2J/d V2–V plots in the two bias regions of 0.6–0.8 and 2.2–2.8 V. They are well explained by the energy separation (~1 eV) between the two quantum levels above the Fermi level in the 4-nm-thick Fe3Si quantum well that was predicted using the Tsu–Esaki formula." @default.
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- W2060057713 date "2009-05-29" @default.
- W2060057713 modified "2023-09-27" @default.
- W2060057713 title "CaF<sub>2</sub>/Fe<sub>3</sub>Si/CaF<sub>2</sub>Ferromagnetic Resonant Tunneling Diodes on Si(111) by Molecular Beam Epitaxy" @default.
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- W2060057713 doi "https://doi.org/10.1143/apex.2.063006" @default.
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