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• W2060149405 abstract "Two organophosphorus compounds, isobutylphosphine and tertiarybutylphosphine, have been investigated for their possible use as precursors in the metalorganic vapor phase epitaxy (MOVPE) process. They are the first organometallic compounds to be used as phosphorus sources. Pyrolysis studies show that the first decomposition products are phosphine and various organic compounds. The phosphine then pyrolyzes to give phosphorus. The materials are less pyrophoric and less toxic than phosphine. Since they are used as liquids in atmospheric pressure bubblers, they are much safer to use. The compounds have been used to grow epitaxial layers of InP on InP and GaAs substrates using trimethylindium in a flowing hydrogen ambient. No evidence of deleterious gas phase reaction is observed. The optimum temperature for growth using IBP is approximately 630°C. This yields excellent morphology layers with the strongest photoluminescence intensity and narrowest half-width, both of which are comparable to InP grown using PH3. Carbon incorporation is nearly identical using IBP and PH3. The IBP and TBP are not quite as pure as the best PH3. The lowest carrier concentration measured was in the low 1016 cm−3 range with room temperature mobilities as high as 2800 cm2/V·s for TBP. Using TBP slightly higher mobilities of 3100 cm2/V· were obtained." @default.
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• W2060149405 date "1986-09-01" @default.
• W2060149405 modified "2023-10-14" @default.
• W2060149405 title "MOVPE growth of InP using isobutylphosphine and tert-butylphosphine" @default.
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• W2060149405 doi "https://doi.org/10.1016/0022-0248(86)90274-5" @default.
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