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- W2060307082 abstract "A novel film fabrication technique, i.e. electrostatic sol-spray deposition (ESSD), has been used in this study to prepare TiO2 thin films of various surface morphologies and crystalline structures. Scanning electron microscopy, X-ray diffraction, Fourier-transform infrared spectroscopy, and UV/Vis absorption spectroscopy were employed to characterize the as-deposited and annealed TiO2 thin films. It has been found that silicon dopant can increase the anatase-to-rutile phase transformation temperature up to about 1050°C. Two possible mechanisms are proposed to explain the phase stabilisation effect, i.e. reduction of the oxygen vacancy concentration by dissolution of SiO2 in the TiO2 lattice and segregation of a SiO2 second phase. The energy bandgap of amorphous SiO2 doped TiO2 films decreases with increasing annealing temperature." @default.
- W2060307082 created "2016-06-24" @default.
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- W2060307082 date "1999-03-01" @default.
- W2060307082 modified "2023-09-25" @default.
- W2060307082 title "Electrostatic sol-spray deposition (ESSD) and characterisation of nanostructured TiO 2 thin films" @default.
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- W2060307082 doi "https://doi.org/10.1016/s0040-6090(98)01160-2" @default.
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