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- W2060756714 abstract "A porous silicon layer (PSL) with pores of 40–200Å diam was electrochemically treated at cathodic potentials in an aqueous solution. The treatment gave rise to the increase in proportion of silicon oxides. The surface had a porous structure of 0.5–2 μm diam after the electrochemical treatment. A comparison study using He‐Ne laser irradiation of the PSL was done that showed no distinct effects in the cathodic reaction rate compared with the electrochemical method. A surface‐type humidity sensor was fabricated using the electrochemically treated silicon and found to be sensitive to changes in humidity over a wide range." @default.
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- W2060756714 date "1990-09-01" @default.
- W2060756714 modified "2023-09-25" @default.
- W2060756714 title "Porous Silicon Oxide Layer Formation by the Electrochemical Treatment of a Porous Silicon Layer" @default.
- W2060756714 doi "https://doi.org/10.1149/1.2087100" @default.
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