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- W2060861863 abstract "This paper describes the multilayer film deposition of Ag and SiO2 nanoparticles using a spin coating process combined with ion-sputtering. The Ag-layer thickness was varied from 20 to 80 nm by controlling the Ag concentration in the colloidal solution. Ion-sputtering was found to be a suitable method of surface modification and prevented phase separation during film deposition. The number of layers ranged from one to ten. Cross-section scanning electron microscope images revealed that the deposited multilayer films had laminated structures with high continuity. The optical properties of the prepared multilayer films also were investigated." @default.
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- W2060861863 date "2008-10-01" @default.
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- W2060861863 title "Multilayer film deposition of Ag and SiO2 nanoparticles using a spin coating process" @default.
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- W2060861863 doi "https://doi.org/10.1016/j.tsf.2008.05.053" @default.
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