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- W2060982137 abstract "Few-layer rippled hexagonal boron nitride (h-BN) membranes were processed with hydrogen plasma, which exhibit distinct and pronounced changes in its electronic properties after the plasma treatment. The bandgaps of the h-BN membrane reduced from ∼5.6 eV at 0 s to ∼4.25 eV at 250s, which is a signature of transition from the insulating to the semiconductive regime. It typically required 250 s of plasma treatment to reach the saturation. It illustrates that two-dimensional material with engineered electronic properties can be created by attaching other atoms or molecules." @default.
- W2060982137 created "2016-06-24" @default.
- W2060982137 creator A5014894349 @default.
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- W2060982137 date "2012-01-06" @default.
- W2060982137 modified "2023-10-02" @default.
- W2060982137 title "Controlling Bandgap of Rippled Hexagonal Boron Nitride Membranes via Plasma Treatment" @default.
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- W2060982137 doi "https://doi.org/10.1021/am201435z" @default.
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