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• W2061570401 abstract "The nanostencil is a tool for resistless lithography. It allows the direct patterning of complex nanometer-sized structures composed of a wide range of materials in an ultrahigh vacuum environment. This is combined with state-of-the-art scanning probe microscopy techniques (atomic force microscopy, scanning tunneling microscopy) and an electronic four-point probe. Moreover, all these capabilities are in situ and autoaligned in the field of view. The direct patterning is based on the shadow-mask technique and allows multimask processes in a static and dynamic manner." @default.
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• W2061570401 date "2005-01-20" @default.
• W2061570401 modified "2023-10-13" @default.
• W2061570401 title "All-in-one static and dynamic nanostencil atomic force microscopy/scanning tunneling microscopy system" @default.
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• W2061570401 doi "https://doi.org/10.1063/1.1852925" @default.
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