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- W2061726105 abstract "We report for the first time investigations on electroless plated-nickel phosphorus alloy (Ni) contacts to undoped amorphous silicon (a-Si:H). I–V characteristics of electroless NiP were compared with those of Nickel deposited by thermal evaporation. It was found that as-deposited NiP makes a rectifying contact to undoped a-Si:H. The effects of plasma annealing on the contacts were studied. NiP contacts on low pressure chemical vapour deposited a-Si are also reported here." @default.
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- W2061726105 date "1994-12-01" @default.
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- W2061726105 title "Electroless plated nickel contacts to hydrogenated amorphous silicon" @default.
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- W2061726105 doi "https://doi.org/10.1016/0040-6090(94)90777-3" @default.
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