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- W2061853203 abstract "A simple two-terminal method is described for the determination of generation lifetime in intrinsic polycrystalline silicon suitable for thin-film transistor applications using a metal/SiO2 /polycrystalline silicon/n-type silicon test structure. The method consists of monitoring the high-frequency capacitance of the test structure after the application of a voltage pulse of the correct polarity to cause deep depletion in the n-type substrate. Generation lifetimes of 34 ps to 19 ns are obtained for polycrystalline silicon films of varying grain size." @default.
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- W2061853203 date "1989-04-17" @default.
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- W2061853203 title "Determination of generation lifetime in intrinsic polycrystalline silicon" @default.
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