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- W2061857243 abstract "Erbium-doped aluminum oxide channel waveguides were fabricated on silicon substrates and their characteristics were investigated for Er concentrations ranging from 0.27 to 4.2 × 10<sup>20</sup> cm<sup>-3</sup>. Background losses below 0.3 dB/cm at 1320 nm were measured. For optimum Er concentrations in the range of 1 to 2 × 10<sup>20</sup> cm<sup>-3</sup>, internal net gain was obtained over a wavelength range of 80 nm (1500-1580 nm) and a peak gain of 2.0 dB/cm was measured at 1533 nm. Integrated Al<sub>2</sub>O<sub>3</sub>:Er<sup>3+</sup> channel waveguide ring lasers were realized based on such waveguides. Output powers of up to 9.5 μW and slope efficiencies of up to 0.11 % were measured. Lasing was observed for a threshold diode-pump power as low as 6.4 mW. Wavelength selection in the range 1530 to 1557 nm was demonstrated by varying the length of the output coupler from the ring." @default.
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- W2061857243 date "2010-02-11" @default.
- W2061857243 modified "2023-09-23" @default.
- W2061857243 title "On-chip integrated lasers in Al 2 O 3 :Er on silicon" @default.
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- W2061857243 doi "https://doi.org/10.1117/12.845842" @default.
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