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W2062195445 abstract "Electrical and physical characteristics of the atomic layer deposited (ALD) beryllium oxide (BeO) grown on the Si and III-V substrates were evaluated as a barrier layer for metal-oxide-semiconductor (MOS) devices. High thermal stability, large energy bandgap (10.6eV), effective diffusion barrier, and low interface defects make BeO an excellent candidate for the interfacial passivation layer in the Si and III-V channel devices." @default.
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W2062195445 date "2011-12-01" @default.
W2062195445 modified "2023-09-26" @default.
W2062195445 title "ALD beryllium oxide: Novel barrier layer for high performance gate stacks on Si and high mobility substrates" @default.
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W2062195445 doi "https://doi.org/10.1109/iedm.2011.6131629" @default.
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