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- W2062288711 abstract "Combining spectroscopic methods probing both occupied as well as unoccupied electronic states, the surface electronic structure of ex situ prepared boron-nitride films is analyzed and compared to experimental and theoretical bulk-electronic properties taken from the literature. X-ray photoelectron spectroscopy is applied to probe the core-level and valence-band electronic states, electron-energy-loss spectroscopy in the reflection geometry to investigate conduction band states as well as excitations like plasmons and core excitons. For films with hexagonal structure, the results from the near-surface region are found to reflect both the ground state and the many-body properties of the bulk material. Cubic boron nitride films in all cases exhibit a hexagonal-like top layer with a thickness of about 0.9 nm. Low-energy ion bombardment at room temperature is found to significantly increase the amount of disorder in both types of films, leading to the transformation of the cubic phase into a hexagonal-like material." @default.
- W2062288711 created "2016-06-24" @default.
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- W2062288711 date "1999-02-15" @default.
- W2062288711 modified "2023-10-09" @default.
- W2062288711 title "Electron spectroscopy on boron nitride thin films: Comparison of near-surface to bulk electronic properties" @default.
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- W2062288711 doi "https://doi.org/10.1103/physrevb.59.5233" @default.
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