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- W2062362108 abstract "By means of isotopic tracing of nitrogen and hydrogen we studied the atomic transport mechanisms during the thermal growth of silicon nitride films in ammonia (14NH3, 15NH3 and 14ND3). The total amounts and the depth profiles of the different isotopes were determined by nuclear reaction analyses and step-by-step chemical etching of the nitride films. A pronounced exchange between hydrogen atoms in the silicon nitride films and those in the nitriding gas was observed, as well as an exchange between the nitrogen atoms on a smaller scale. The results of the present investigation indicate that the atomic transport through the growing nitride film occurs via nitrogenous species that include hydrogen. Silicon atoms or ions can also take part in the growth process but they cannot be the only mobile species." @default.
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- W2062362108 date "1995-05-01" @default.
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- W2062362108 title "Atomic transport during thermal growth of silicon nitride" @default.
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- W2062362108 doi "https://doi.org/10.1016/0168-583x(95)00211-1" @default.
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