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• W2062407507 abstract "ZEP520A (1:1 copolymer of α-chloromethacrylate and α-methylstyrene, ZEON) is a main-chain scission-type positive-tone resist used for electron beam (EB) lithography and is known for its high sensitivity and high resolution. In this study, ZEP520A was irradiated using a 100 kV EB, and the decomposition mechanisms were analyzed by gel permeation chromatography, Fourier transform IR spectroscopy, NMR spectroscopy, and pulse radiolysis. Chlorines were confirmed to easily dissociate as Cl- ions (dissociative electron attachment, DEA) and ZEP520A underwent β-scission. Multiple channels could be considered for the main-chain scission, including DEA and the charge transfer complex between phenyl radical cations and Cl- ions." @default.
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• W2062407507 date "2012-02-22" @default.
• W2062407507 modified "2023-10-09" @default.
• W2062407507 title "Electron-Beam-Induced Decomposition Mechanisms of High-Sensitivity Chlorinated Resist ZEP520A" @default.
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• W2062407507 doi "https://doi.org/10.1143/apex.5.036501" @default.
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