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- W2062510641 abstract "An increasing number of interesting new heterojunction structures rely on compositional gradients rather than abrupt heterojunctions. The use of rapid shuttering with a variable duty cycle is currently the most commonly used way of achieving the desired grading in molecular beam epitaxial (MBE) growth since thermal source ramping to achieve such grading suffers from problems of thermal lag and non-steady-state temperature distributions in the evaporation sources. In this work, we get around these obstacles by using reflective high energy electron diffraction (RHEED) oscillations to measure actual compositions during trial gradings and then use rhis direct data to fine tune the thermal ramps to achieve the desired compositional profile. The result is a graded layer with a precise reproducible profile grown without the complications of multiple interfaces and possible non-linear effective average properties inherent in the rapid shuttering Technique. These layers can then later be inserted during actual growth runs within more complex structures." @default.
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- W2062510641 date "1987-02-01" @default.
- W2062510641 modified "2023-09-25" @default.
- W2062510641 title "Precisely controlled compositional gradients in MBE grown AlGaAs/GaAs structures" @default.
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- W2062510641 doi "https://doi.org/10.1016/0022-0248(87)90360-5" @default.
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