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- W2062555943 abstract "In this paper, we present a thermally measurable contact and noncontact-type thermoelectric sensor using a silicon-on-insulator (SOI) structure, because single-crystal silicon has a higher Seebeck coefficient than any other thermoelectric material. The sensor was designed to have 17 pairs of n- and p-type single-crystal silicon strips and a selective absorption area (SAA) that consists of aluminum and silicon dioxide. The thermoelectric sensor based on the SOI structure was fabricated and measured using a complementary metal–oxide–semiconductor (CMOS) process. The measured sensitivity of the sensor was 0.19 mV/°C, when human skin directly touched the sensor surface. In the noncontact measurement of the sensor while varying the distance between the lamp (EFD10EL/8, NEC) and the sensor, the maximum electromotive force (EMF) of the sensor was -1.55 mV at a 2 mm (6.09 mW) distance." @default.
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- W2062555943 date "2007-11-06" @default.
- W2062555943 modified "2023-09-28" @default.
- W2062555943 title "Fabrication of Thermoelectric Sensor Using Silicon-on-Insulator Structure" @default.
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- W2062555943 doi "https://doi.org/10.1143/jjap.46.7232" @default.
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