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• W2062623692 abstract "The application of the phase-shift method allows a significant resolution enhancement for proximity lithography in mask aligners. Typically a resolution of 3 µm (half-pitch) at a proximity distance of 30 µm is achieved utilizing binary photomasks. By using an alternating aperture phase shift photomask (AAPSM), a resolution of 1.5 µm (half-pitch) for non-periodic lines and spaces pattern was demonstrated at 30 µm proximity gap. In a second attempt a diffractive photomask design for an elbow pattern having a half-pitch of 2 µm was developed with an iterative design algorithm. The photomask was fabricated by electron-beam lithography and consists of binary amplitude and phase levels." @default.
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• W2062623692 date "2014-06-24" @default.
• W2062623692 modified "2023-09-27" @default.
• W2062623692 title "Resolution enhancement for advanced mask aligner lithography using phase-shifting photomasks" @default.
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• W2062623692 doi "https://doi.org/10.1364/oe.22.016310" @default.
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