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- W2062685736 abstract "Physical thinning of the gate dielectric due to uniaxial tensile stress is expected to improve the subthreshold swing (Sts) of both n-channel and p-channel metal-oxide-semiconductor (MOS) transistors. However, experimentally, we observed a small improvement in Sts of n-channel MOS transistors but a small degradation in Sts of p-channel MOS transistors due to the application of uniaxial tensile stress. Uniaxial tensile stress modifies the out-of-plane effective mass of electrons or holes, resulting in a change in Sts, which can be predicted by quantum mechanics." @default.
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- W2062685736 date "2009-04-27" @default.
- W2062685736 modified "2023-10-16" @default.
- W2062685736 title "Improvement of subthreshold swing of n-channel transistor by uniaxial tensile stress due to a quantum mechanical mechanism instead of physical thinning" @default.
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- W2062685736 doi "https://doi.org/10.1063/1.3125248" @default.
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