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- W2062918494 abstract "Abstract The effect of air and hydrogen contamination on the electrical resistivity of Er, Ho, Dy, Tb, Gd and Yb films was studied. The resistivity of the films increases almost discontinuously as soon as air is admitted into the vacuum chamber. After this sudden increase, the change becomes slow and the resistivity attains a constant value for thicker films (> 200 A). For very thin films ( 2 has a higher resistivity than pure Yb. For thin erbium films (about 200 A) at a hydrogen pressure of several torrs the resistivity rises again after reaching a minimum value. This increase is thought to be due to the interstitial solution of hydrogen in the metallic conductor ErH 2 . The investigation supports an earlier suggestion of the authors that the dihydride phase present in rare earth metal films (except Yb and Eu) made in ordinary vacuum may decrease the resistivity of these films below their bulk value." @default.
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- W2062918494 date "1977-07-01" @default.
- W2062918494 modified "2023-09-23" @default.
- W2062918494 title "The effect of oxygen and hydrogen contamination on the electrical resistivity of rare earth metal films" @default.
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- W2062918494 doi "https://doi.org/10.1016/0040-6090(77)90458-8" @default.
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