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- W2063014744 abstract "A contact poling technique for domain engineering of ferroelectrics using a micro-structured silicon electrode is demonstrated on Rb:KTiOPO4. High quality QPM gratings were reproducibly fabricated. The silicon electrode is reusable and the technique potentially suitable when complex structures with sub-μm features are to be domain engineered, which otherwise is incompatible with conventional photolithography. A non-negligible domain broadening was seen and attributed to a low nucleation rate using this type of electrode. However, under the appropriate poling conditions, this could be exploited to obtain a QPM grating with a short pitch (2 μm), equal to half of the electrode period." @default.
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- W2063014744 date "2015-01-12" @default.
- W2063014744 modified "2023-09-23" @default.
- W2063014744 title "Contact poling of Rb:KTiOPO_4 using a micro-structured silicon electrode" @default.
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- W2063014744 doi "https://doi.org/10.1364/oe.23.000636" @default.
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