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- W2063152014 abstract "Electromigration along dislocation cores is considered as a mass-transport mechanism, in conducting lines of bamboo-like grains, below one half of the melting temperature. Given that the dislocation density in annealed metals may be insufficient to account for the observed mass-transport rate, this paper focused on electromigration-induced dislocation motion and multiplication. A prismatic loop climbs like a rigid ring, as electromigration relocates atoms along the core, from one portion of the loop to the other. Each loop is therefore a mass carrier: a vacancy loop migrates towards the cathode and an interstitial loop towards the anode. Furthermore, a thread of an edge dislocation multiplies prismatic loops under a sufficiently high electric field. A bamboo grain-boundary catches loops on one side and emits on the other. Available empirical facts are discussed according to this picture, including lifetime, linewidth, stress gradient and alloying." @default.
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- W2063152014 date "1994-11-01" @default.
- W2063152014 modified "2023-09-22" @default.
- W2063152014 title "Electromigration-induced dislocation climb and multiplication in conducting lines" @default.
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- W2063152014 doi "https://doi.org/10.1016/0956-7151(94)90424-3" @default.
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