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• W2063382214 abstract "In this paper, we demonstrate excellent material characteristics of TiPrO and high-density metal-insulator-metal (MIM) capacitors using high-work-function Ir top electrode. Low leakage current of at and high capacitance density are achieved for anneal TiPrO, which also meets the International Technology Roadmap for Semiconductors goals (at year 2018) of density and . Furthermore, the improved high capacitance density TiPrO MIM was obtained at a higher anneal temperature, where a low leakage current of was measured at . These good performances indicate that TiPrO MIM is suitable for analog/radio frequency integrated circuits." @default.
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• W2063382214 date "2009-01-01" @default.
• W2063382214 modified "2023-09-24" @default.
• W2063382214 title "High-Performance Metal-Insulator-Metal Capacitor Using Quality Properties of High-κ TiPrO Dielectric" @default.
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• W2063382214 doi "https://doi.org/10.1149/1.3073549" @default.
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